Cibles de pulvérisation
(78)
Pureté ultra grande de cuivre 99,999%, 99,9999% de cible de pulvérisation de plat
Prix: 15～100USD/kg
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:Copper Plate Sputtering Target, Sputtering Target Ultra High Purity
Copper Plate Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999% For precise control of impurity content, Ag cont... Voir plus
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Grande pureté de plat de cibles titaniques de pulvérisation pour des puces de semi-conducteur
Prix: 20～200USD/kg
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:Titanium Plate Sputtering Targets, Sputtering Target For Semiconductor Chips, Customized CIP Sputtering Target
Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Products include low oxygen ultra-high purity titanium material, high-end titanium alloy material, production equipment and process development of low oxy... Voir plus
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Cibles de pulvérisation en métal de grande pureté du zirconium Zr702
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:High Purity Metal Sputtering Targets, Zirconium Sputtering Targets, Zr702 Sputtering Targets
High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good corrosion resistance in nitric acid not more than... Voir plus
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99,95% cible pure de pulvérisation de Zr de cible de pulvérisation de zirconium pour l'industrie d'optique
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:PVD Coating Sputtering Targets, Forged Sputtering Targets, Zirconium Zr702 Sputtering Targets
99.95% Pure Zirconium Sputtering Target Zr Sputtering Target for Optics Industry we focus on zirconium materials and its application for a long time. zirconium sputtering target and arc cathodes are well known and extensively used in PVD coating field because of the high purity, fine grain sizes, ho... Voir plus
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Le chrome pulvérisent des cibles de dispositif d'enduction, cibles de pulvérisation de Cr de chrome, disque ou annulaire pulvérisez les cibles pour pulvérisent des dispositifs d'enduction
Prix: 20～100USD/kg
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters Information Chromium is one of the most popular metals in the world. Chromium is a silvery, lustrous, hard, and brittle metal known for its high mirror polish and corrosion resistance. ... Voir plus
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Cibles cylindrique titaniques de pulvérisation, dépôt titanique de la couche mince de cible de cylindre de rotation, magnétron
Prix: 20～200USD/kg
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron high purity Rotatory Titanium sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physica... Voir plus
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99,8% les cibles de la pulvérisation Ti70Al30 nettoient à l'aspirateur des techniques de fonte
Prix: 10-100USD/kg
MOQ: 10kgs
Heure de livraison: 10days
Marque: Jinxing
Souligner:Ti70Al30 Sputtering Targets, 99.8% tial Sputtering Targets, Vacuum Melting Sputtering Targets
Ti70Al30 Sputtering Targets JX offers a wide range of Ti Al Sputtering Targets for decorative and/or wear resistance coatings to provide black, gold, silver, red and rainbow color simulation on items such as cell phone, watch, glasses, bath parts and hardware, artwork, etc. Ti, Cr, Zr, TiAl, Ni, Cu,... Voir plus
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Alliage d'aluminium titanique de Ti50Al50 TiAl avec la grande pureté 99%
Prix: USD50-100
MOQ: 10kgs
Heure de livraison: 15days
Marque: JX
Souligner:Ti50Al50 Titanium Aluminum Alloy, 99% Titanium Aluminum Alloy, Ti50Al50 TiAl Alloy
Titanium Aluminum (TiAl) Alloy with high purity 99% Ti50Al50 Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application, JX will offer the right one for yo... Voir plus
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Cibles en aluminium TiAl7030 de pulvérisation de titane de grande pureté
Prix: USD50-100
MOQ: 10kgs
Heure de livraison: 15days
Marque: JX
Souligner:Titanium Aluminum Sputtering Targets, High Purity Sputtering Targets, TiAl7030 Sputtering Targets
high purity Titanium Aluminum Sputtering Target TiAl7030 To better serve you, we would like to discuss your specific requirement, Please Contact Us for a quote. Titanium Aluminum Sputtering Target Features Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target... Voir plus
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90:10 de cibles de pulvérisation d'Alsi de silicium/matériel en aluminium évaporation du 80:20 At%
Prix: 20～150USD/kg
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:Aluminum Silicon Alsi Sputtering Targets, Alsi Sputtering Targets 90:10, 80:20 Alsi Sputtering Targets
Aluminum Silicon Sputtering Target (AlSi) alloy 90:10/ 80:20 at% After the development of sputtering coating technology in recent years, the coating technology for various materials has been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, a... Voir plus
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ASTM B386 PVD a poli des cibles de pulvérisation de molybdène
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:Polished Molybdenum Sputtering Targets, PVD Sputtering Targets, ASTM B386 Sputtering Targets
Polished surface Molybdenum Round Sputtering Target Metal For PVD Molybdenum is a silver-white metal, hard and tough, high melting point, high thermal conductivity,molybdenum has the advantages of high strength, high melting point, corrosion resistance, wear resistance, etc., Molybdenum Sputtering T... Voir plus
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L'alliage d'aluminium titanique pulvérisant vise le pressing de HIP
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:Aluminum Alloy Sputtering Targets, Titanium Sputtering Targets, HIP Pressing Sputtering Targets
Titanium Sputtering target Size 1. Round target: Ø30--2000mm, thickness 3.0mm--300mm;2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm4. Customized is available Grade Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-... Voir plus
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Cible de pulvérisation de zirconium de la métallisation sous vide de PVD Zr702
Prix: Negotiable
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:Vacuum Coating Zirconium Sputtering Target, PVD Coating Zirconium Sputtering Target, Zr702 Zirconium Sputtering Target
High Quality Zirconium Target for PVD Vacuum Coating Machine Zirconium Sputtering Target For Coating Zirconium target: 1. Zirconium target, Zr702 2. Zr705 3.Ti/Zr alloy 4. Nb/Zr alloyOther grade and alloy 5. by request 6.Type: plane target, step target, rotating target 7.Standard: national standard... Voir plus
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Cible de Ti70% Al30% Tial dans des valves non-corrosives
Prix: 10-100USD/kg
MOQ: 10kgs
Heure de livraison: 10days
Marque: Jinxing
Souligner:Al30% Tial Target, Ti70% Tial Target, Ti70al30 Tial Target
Ti70al30 TiAl Targets Titanium-aluminum alloy sputtering targets (TiAl Targets )can be manufactured in two ways: HIP and melting. The goal through HIP will be higher density. The target through melting will have a higher purity. Everything is based on your application. Purity: Al-Ti35/65 at% Al/Ti 5... Voir plus
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Aluminium titanique de cible de pulvérisation du Ti 65% d'Al 35%
Prix: 10-100USD/kg
MOQ: 10kgs
Heure de livraison: 10days
Marque: Jinxing
Souligner:Ti 65% Sputtering Target, Al 35% Sputtering Target, Al 35% tantalum sputtering target
Sputtering Target Titanium-Aluminum Aluminum titanium (AlTi) alloy sputtering targets are produced by HIP technology and are widely used in tool coatings and decorative coatings. Compared with the melting process, the TiAl target prepared by the HIP process has a more uniform microscopic internal st... Voir plus
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Conduction thermique élevée forgée de cible en aluminium titanique de TiAl
Prix: 10-100USD/kg
MOQ: 10kgs
Heure de livraison: 10days
Marque: jx
Souligner:Titanium Aluminum TiAl Target, Forged TiAl Target, HIP TiAl Target
Titanium Aluminum (TiAl) Targets Titanium aluminum (TiAl) targets and cathodes allow drills, milling machines, indexable cutting inserts and other tools to be protected by a strong anti-oxidation nitride coating (TiAlN). High feed rate, excellent cutting performance, high metal removal rate: this is... Voir plus
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Rendement titanique en aluminium de moulage mécanique sous pression de haute de cible d'alliage du diamètre 300mm
Prix: 10-100USD/kg
MOQ: 10kgs
Heure de livraison: 10days
Marque: jx
Souligner:300mm Aluminum Titanium Alloy Target, Die Castin Aluminum Titanium Alloy Target, Aluminum Titanium Alloy Target
Aluminum Titanium Alloy Target Aluminum Titanium Alloy Target is a metal material with high die-casting yield, high density, high strength and good flexibility. The difference between aluminum-titanium alloy and titanium-aluminum alloy lies in the ratio of these two elements. Aluminum-titanium alloy... Voir plus
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Cibles en aluminium titaniques Ti70Al30 Ti75Al25 de pulvérisation de Ti-Al
Prix: USD50-100
MOQ: 10kgs
Heure de livraison: 15days
Marque: JX
Souligner:Ti-Al Sputtering Targets, Ti70Al30 Sputtering Targets, Ti75Al25 Sputtering Targets
Titanium Aluminum target, Ti-Al target Ti70Al30, Ti75Al25 Ti-Al target Widely used in Decorating films. Gold, silver, balck and coloful series Decorating films And used in some functional films. Wear resistance film, anti-friction film, corrosin resistance film, self-lubricating film. competitive an... Voir plus
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Cible fine de pulvérisation de tungstène de grosseur du grain avec la hanche/CIP/processus de forge
Prix: 20～150USD/kg
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:Fine Grain Tungsten Sputtering Target, Sputtering Target With Hip, Forge Process Tungsten Sputtering Target
Tungsten Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide film to realize its functional transition in the semiconductor device. Due to the high melting point of tungsten, tungsten targets are mainly prepared b... Voir plus
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Certificat d'OIN 9001 du diamètre 140mm/D60mm /57mm de cibles de pulvérisation du zirconium Zr702
Prix: 20～100USD/kg
MOQ: 1kg
Heure de livraison: 10～25 work days
Marque: JINXING
Souligner:Diameter 140 mm Sputtering Targets, Decorative coating Sputtering Targets, 57 mm Sputtering Targets
Zirconium Target Magnetron sputtering target Diameter 140mm/D60mm /57mm Zirconium target for PVD coating systerm, coating target, multi-arc target, sputtering target, vacuum coating target. JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spra... Voir plus
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