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cible de pulvérisation

(9)
Chine Fabricant de matériaux de cible de pulvérisation d'argent 99,95% feuille de cible de pulvérisation ronde à vendre

Fabricant de matériaux de cible de pulvérisation d'argent 99,95% feuille de cible de pulvérisation ronde

Prix: $500-600/kg
MOQ: 1pieces
Heure de livraison: 10-15days
Marque: HaiChuan
Souligner:silver Sputtering Target, Sputtering Target 99.95%, round target sliver sheet
shape round plate purity 99.999 Material silver size customized FAQ Q1: Can I order a sample quantity ? A1: Yes, we have no MOQ. Q2: Can I add my logo on the boxes/cartons? A2: Yes,OEM and ODM are available from us. Q3: What are the benefits of being a distributor ? A3: Special discount Marketing pr... Voir plus
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Chine Fourniture directe d'usine 99,95% cible de pulvérisation de platine cible de pulvérisation de platine Pt à vendre

Fourniture directe d'usine 99,95% cible de pulvérisation de platine cible de pulvérisation de platine Pt

Prix: $3000-7700/kg
MOQ: 10kg
Heure de livraison: 10-15days
Marque: HaiChuan
Souligner:99.95% platinum target, platinum target 99.95%, PT platinum target odm
Factory direct supply 99.95% Platinum Target,Platinum Pt Sputtering Target A platinum sputtering target is a disc-shaped material made of high-purity platinum metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from ... Voir plus
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Chine Cible d'or de pulvérisation de haute pureté 99,999% pour le revêtement de pulvérisation par magnétron à vendre

Cible d'or de pulvérisation de haute pureté 99,999% pour le revêtement de pulvérisation par magnétron

Prix: $150-550/kg
MOQ: 10kg
Heure de livraison: 10-15days
Marque: HaiChuan
Souligner:99.999% rare metal alloys rare, rare metal alloys 99.999% rare, rare metal alloys 99.999% rare
High purity Gold Sputtering Target 99.999% for Magnetron Sputtering Coating A gold sputtering target is a disc-shaped material made of high-purity gold metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from the tar... Voir plus
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Chine Cible de pulvérisation de titane de haute pureté 4N5 Disques ronds Cible pour revêtement à vendre

Cible de pulvérisation de titane de haute pureté 4N5 Disques ronds Cible pour revêtement

Prix: $270-290/kg
MOQ: 10kg
Heure de livraison: 10-15days
Marque: HaiChuan
Souligner:purity round target, 4N5 round target, titanium sputtering ISO9001
high purity 4N5 titanium sputtering target round discs target for coating A titanium sputtering target is a disc-shaped material made of high-purity titanium metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from t... Voir plus
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Chine Plaque de tantale 99,95% cible de pulvérisation de tantale pur / plaque de tantale / feuille / disque à vendre

Plaque de tantale 99,95% cible de pulvérisation de tantale pur / plaque de tantale / feuille / disque

Prix: $280-300/kg
MOQ: 10kg
Heure de livraison: 10-15days
Marque: HaiChuan
Souligner:99.95% Pure Sputtering Target, Tantalum Sputtering Target, tantalum Plate disc
Tantalum Plate 99.95% Pure Tantalum Sputtering Target/tantalum Plate /sheet/disc A tantalum sputtering target is a disc-shaped material made of high-purity tantalum metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms... Voir plus
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Chine 99.95% Cible de pulvérisation Mo1 de haute pureté Parties spéciales de molybdène Cible de pulvérisation de molybdène à vendre

99.95% Cible de pulvérisation Mo1 de haute pureté Parties spéciales de molybdène Cible de pulvérisation de molybdène

Prix: $58-65/kg
MOQ: 10kg
Heure de livraison: 10-15days
Marque: HaiChuan
Souligner:99.95% High purity Sputtering Target, Mo1 Sputtering Target, molybdenum sputtering ISO9001
99.95% High purity Mo1 molybdenum special parts molybdenum sputtering target Molybdenum sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target material are ... Voir plus
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Chine Cible de pulvérisation du chrome Pvd / Cible de prix du chrome / Cible de pulvérisation du cr à vendre

Cible de pulvérisation du chrome Pvd / Cible de prix du chrome / Cible de pulvérisation du cr

Prix: $35-60/kg
MOQ: 10kg
Heure de livraison: 10-15days
Marque: HaiChuan
Souligner:pvd chromium target, chrome chromium target, Cr chrome target
pvd chromium sputtering target/chrome target price/Cr sputtering target Chromium sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected... Voir plus
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Chine Cible de pulvérisation de zirconium Zr Cible pour revêtement de pulvérisation à vendre

Cible de pulvérisation de zirconium Zr Cible pour revêtement de pulvérisation

Prix: $35-45/kg
MOQ: 10kg
Heure de livraison: 10-15days
Marque: HaiChuan
Souligner:Sputtering Zirconium Target, Zr Zirconium Target, Zr Target For Sputtering Coating
Zirconium Sputtering Target Zr Target For Sputtering Coating Zirconium sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected and depos... Voir plus
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Chine Équipement de laboratoire 5n/6n 99,999% Si de haute pureté à pulvérisation de silicium à vendre

Équipement de laboratoire 5n/6n 99,999% Si de haute pureté à pulvérisation de silicium

Prix: $70-90/kg
MOQ: 10kg
Heure de livraison: 10-15days
Marque: HaiChuan
Souligner:5nSputtering Target, 6n 99.999% Sputtering Target, silicon sputtering Optical Coating
lab equipment 5n/6n 99.999% High Pure Si Silicon Sputtering Target Optical Coating Materials Silicon sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target ... Voir plus
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